My paper : R.K. Nahar and N.M. Devashrayee, “Effect of Si on the Reaction Kinetics of Ti/AISi Bilayer Structures”, Appl. Phys. Lett., Vol. 50, Issue 3; Jan. 19, 1987; pp. 130 13 was cited in US Patent : US 5902504 A : Systems and methods for determining semiconductor wafer temperature and calibrating a vapor deposition device.